http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101484572-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-223 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82B3-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82B3-00 |
| filingDate | 2011-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2015-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2015-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101484572-B1 |
| titleOfInvention | Manufacturing device for nano particle attached to support |
| abstract | The present invention relates to a vacuum deposition apparatus, A stirring tank provided in the vacuum evaporation tank; A screw provided in the stirring tank and stirring the carrier; And an evaporation source provided on an upper part of the stirring tank in the vacuum evaporation tank for evaporating a metal or a metal compound, wherein the upper end of the side surface of the stirring tank is connected to the upper end of the stirring vessel, Characterized in that the screw is curved in the center direction by 1 to 90 degrees with respect to the vertical plane and the screw is arranged to agitate 1/5 to 3/4 of the total depth of the carrier charged in the agitating tank in the horizontal or vertical direction. There is provided an apparatus for producing metal or metal compound nanoparticles attached to a carrier. The apparatus for producing nanoparticles of the present invention is characterized in that the nanoparticle production apparatus of the present invention does not cause excessive scattering in a vacuum chamber, minimizes the mechanical load, transports the carrier at a constant speed, uniformizes the agitation of the carrier to increase the deposition efficiency, And the mechanical durability of the equipment can be improved by minimizing the mechanical load and the load of the equipment. |
| priorityDate | 2011-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.