http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101475308-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 2008-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101475308-B1 |
| titleOfInvention | Abrasive solution for metal and polishing method using same |
| abstract | A polishing solution for polishing a barrier layer containing ruthenium in a chemical mechanical polishing process of a semiconductor device having a barrier layer containing ruthenium on a surface and a conductive metal wiring, the polishing solution comprising an oxidant and a Mohs hardness of 5 or more, Wherein the abrasive grains contain abrasive grains having a composition other than silicon dioxide (SiO 2 ). The present invention also relates to a method for manufacturing a semiconductor device, comprising the steps of bringing the polishing liquid into contact with a surface to be polished of a substrate having ruthenium on the surface and a substrate having a conductive metal interconnection and polishing the surface to be polished of the substrate and the polishing surface of the polishing pad to 0.69 kPa To 20.68 kPa. The present invention also provides a polishing method in a chemical mechanical polishing process of a semiconductor device.n n n Abrasive solution for metal, polishing method |
| priorityDate | 2007-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 219.