http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101451617-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2012-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101451617-B1 |
| titleOfInvention | Compositions and processes for immersion lithography |
| abstract | A novel photoresist composition useful for immersion lithography is provided. Preferred photoresist compositions of the present invention comprise one or more materials having a water contact angle that can be varied by a base treatment and / or one or more materials containing a fluorinated photoacid-labile group and / or containing an acidic group located away from the polymer backbone One or more materials. Particularly preferred photoresists of the present invention can reduce the leaching of resist material into the immersion fluid in contact with the resist layer during the immersion lithography process. |
| priorityDate | 2006-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 132.