http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101449401-B1

Outgoing Links

Predicate Object
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-2003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4236
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66431
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66462
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66666
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-2003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7783
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336
filingDate 2010-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2014-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2014-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101449401-B1
titleOfInvention Quantum-well-based semiconductor devices
abstract A quantum well based semiconductor device and a method of forming a quantum well based semiconductor device are described. The method includes providing a heterostructure disposed on a substrate and including a quantum well channel region. The method also includes forming a source and drain material region over the quantum well channel region. The method also includes forming a trench in the source and drain material regions to provide a source region that is separate from the drain region. The method also includes forming a gate dielectric layer in the trench between the source and drain regions and forming a gate electrode in the trench above the gate dielectric layer.
priorityDate 2009-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008227246-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5986291-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008010803-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID292779
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559169
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419545842
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9989226
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID117559
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3468413
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID82901
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524988
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419578761
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID31170
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419520488
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451818717
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359967
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419557764

Total number of triples: 35.