http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101446368-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-43 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3245 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-46 |
| filingDate | 2008-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101446368-B1 |
| titleOfInvention | Oxometallate-based, etch residue-activated formulations activated by peroxide |
| abstract | (C) at least one water soluble, metal ion-free silicate corrosion inhibitor drug, preferably at least one water soluble, at least one metal ion-free base, in an amount sufficient to produce a final formulation of alkaline pH; 0.01% to about 5 (in terms of% SiO 2) wt%, (d) 1 or more metal chelating agent from about 0.01% to about 10% by weight, and (e) 1 or more oxy-metal rate of 0% by weight, greater than about 2.0 wt. % ≪ / RTI > of a high alkaline aqueous formulation. These agents are mixed with peroxides to form peroxymetalates to produce microelectronic cleaning compositions. Is used to remove contaminants and residues from microelectronic devices, e. G., Microelectronic substrates.n n n Cleaning compositions, etching residues, peroxides, oxometallates, microelectronic devices |
| priorityDate | 2007-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 123.