http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101438384-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2008-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101438384-B1 |
| titleOfInvention | Composition for forming silicon-containing fine pattern and method for forming fine pattern using the same |
| abstract | The present invention provides a composition for forming a fine pattern for forming a fine pattern having high dry etching resistance and a method for forming such a fine pattern. The composition includes a resin containing a repeating unit having a silazane bond and a solvent. The method for forming a fine pattern according to the present invention includes a step of treating a resist pattern using such a composition. |
| priorityDate | 2007-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.