http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101436336-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2006-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101436336-B1 |
| titleOfInvention | A silicon-containing resist lower layer film forming composition for forming a resist lower layer film of photo- |
| abstract | A semiconductor substrate having a hole with a large dry etching rate which is used in a lower layer of the photoresist in the lithography process of the semiconductor device manufacturing and does not intermix with the photoresist, A lower layer film on which a surface can be planarized, and a lower layer film forming composition for forming the lower layer film.n n n (A) containing 5 to 45 mass% of silicon atoms, a photopolymerization initiator (B) and a photopolymerization initiator (B) containing 5 to 45 mass% of silicon atoms in a lower layer film used for a lower layer of a photoresist in a lithographic process of manufacturing semiconductor devices And a solvent (C).n n n n Lithography, photoresist, dry etching, intermixing, silicon atoms, polymerizable compounds, photopolymerization initiators |
| priorityDate | 2005-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 618.