| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C43-23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-712
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C39-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C43-23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C39-17 |
| filingDate |
2008-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2014-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101431295-B1 |
| titleOfInvention |
Compound and radiation-sensitive composition |
| abstract |
The present invention relates to a compound which is a material of a radiation-sensitive composition capable of effectively forming a resist film capable of forming a fine pattern with high accuracy and stably, excellent in sensitivity to an electron beam and low in roughness, ≪ / RTI >n n n ≪ Formula 1 >n n n n n n n n A radiation sensitive composition, a chemically amplified positive resist film |
| priorityDate |
2007-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |