http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101420600-B1

Outgoing Links

Predicate Object
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78696
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1214
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-786
filingDate 2007-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2014-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2014-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101420600-B1
titleOfInvention Semiconductor device
abstract It is an object of the present invention to realize miniaturization and high performance of a field effect transistor formed on a substrate having an insulating surface. In particular, the object of the present invention is to realize miniaturization and high performance of a thin film transistor in which a channel forming region is formed in a semiconductor layer crystallized by irradiating heat or light energy to a semiconductor having an amorphous structure. n A semiconductor device having a so-called SOI structure in which an element is constituted by a semiconductor layer on an insulating surface, the semiconductor layer is composed of a semiconductor layer having a thickness of 5 nm to 30 nm and extremely thin. Wherein the semiconductor layer has a gate insulating layer with a thickness of 2 nm to 20 nm and a gate electrode, and the channel length is 10 times or more and less than 40 times the thickness of the semiconductor layer. By making the semiconductor layer thinner, it acts to make it difficult to be influenced by the concentration of one conductivity type impurity added to the channel forming region. n n An insulating surface, a substrate, a field effect transistor, a semiconductor layer, an amorphous structure
priorityDate 2006-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000277737-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000294799-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-19990006832-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID512737
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID613808
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419526467
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559310
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID100858576
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID82895
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID9894
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID10229
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID1195
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID30140
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415776239
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5462311
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID522684
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579069
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID78989
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID457364
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426098968
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559585
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID459865
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419593443
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID12748
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491804
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID301434
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID425060
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID12747
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID490427
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359268
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID518712
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID558981
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6327157
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3084099
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID850950
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID1196
http://rdf.ncbi.nlm.nih.gov/pubchem/gene/GID365842
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419522015
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5360835

Total number of triples: 53.