http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101414170-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H2245-50 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-088 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-466 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y30-00 |
| filingDate | 2012-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101414170-B1 |
| titleOfInvention | Apparatus for processing plasma |
| abstract | The plasma processing apparatus of the present invention is characterized in that the passage for plasma treatment of the material to be plasma-treated has a bent connection pipe connecting the linear holes and the linear holes in the reactor and controls the supply amount of the material to be supplied into the reactor It is possible to do. According to the present invention, by increasing the discharge processing exposure time of the material to be plasma-treated, it is possible not only to enable production of a material capable of more uniform and constant electrical and physical property conversion, So that various adjustments and modifications of the apparatus can be made easily. |
| priorityDate | 2012-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.