http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101414168-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32458 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-34 |
| filingDate | 2012-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101414168-B1 |
| titleOfInvention | Apparatus for processing plasma |
| abstract | The plasma processing apparatus of the present invention allows the passage path for the plasma treatment of the material to be plasma-treated to have a coil-shaped dielectric in the reactor and to control the supply amount of the material to be treated supplied into the reactor. According to the present invention, by increasing the discharge processing exposure time of the material to be plasma-treated, it is possible not only to make production of a material capable of more uniform and constant electrical and physical characteristic conversion, but also to change the electrical and physical characteristics So that various adjustments and modifications of the apparatus can be easily made. |
| priorityDate | 2012-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.