http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101412862-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2201-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-252 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-03 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-249969 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-166 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2201-23 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2201-12 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-1453 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B19-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C3-06 |
| filingDate | 2007-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101412862-B1 |
| titleOfInvention | Quartz glass base material and method of manufacturing the quartz glass base material |
| abstract | In the base material having a fine concavo-convex pattern on its surface, the dimension of the concavo-convex pattern in the vertical direction of the quartz glass base material is adjusted to be uniform over the whole base material surface with high accuracy. The quartz glass substrate has been manufactured to have a hypothetical temperature distribution of up to 40 ° C and a halogen concentration of less than 400 ppm or a hypothetical temperature distribution of up to 40 ° C, a halogen concentration of at least 400 ppm and a halogen concentration distribution of up to 400 ppm, The etching speed of the surface of the base material is made uniform and the dimension of the concavo-convex pattern in the vertical direction of the quartz glass base material is controlled to be uniform over the whole base material surface with good accuracy.n n n n Uneven pattern, quartz glass substrate. |
| priorityDate | 2006-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 43.