http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101404459-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2007-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101404459-B1 |
| titleOfInvention | Photosensitive paste composition for forming plasma display panel barrier ribs and plasma display panel barrier rib forming method |
| abstract | The present invention relates to a photosensitive paste composition for forming PDP barrier ribs and a PDP barrier rib forming method, and more particularly, to a photosensitive paste composition for forming PDP barrier ribs containing an inorganic component containing glass powder and filler and a photosensitive organic component, And at least 70% by weight of quartz. The present invention also relates to a photosensitive paste composition for forming a PDP barrier rib.n n n The photosensitive paste composition for forming a PDP barrier rib of the present invention is suitable for photolithography using ultraviolet light irradiation. The photolithography process is a one-time photolithography process in which a thick partition wall is formed so as to have no collapse of a partition wall and have a good firing profile Not only high strength and high resolution can be realized, but also a safe barrier rib pattern can be formed by securing a firing margin.n n n PDP barrier ribs, photosensitive paste,? -Quartz |
| priorityDate | 2007-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 135.