http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101400585-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76898 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7684 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04 |
| filingDate | 2010-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101400585-B1 |
| titleOfInvention | Polishing agent for copper polishing and polishing method using the same |
| abstract | The present invention relates to a lubricant composition comprising (A) at least two inorganic acids, (B) an amino acid, (C) a protective film forming agent, (D) an abrasive grain, (E) (B) is not less than 0.20 mol / kg, the content of the component (C) is not less than 0.02 mol / kg, and at least one of the following (i) and (ii) The present invention provides an abrasive for polishing copper. (i) the content of the component (A) relative to the content of the component (C) is at least 2.00. (ii) at least one selected from (G) an organic acid and an acid anhydride thereof. |
| priorityDate | 2009-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 175.