http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101399516-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D11-001 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D11-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D3-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29K75-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29L31-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29L31-58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29K105-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D11-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C39-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-26 |
| filingDate | 2007-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101399516-B1 |
| titleOfInvention | Abrasive pad and manufacturing method thereof |
| abstract | A first object of the present invention is to provide a polishing pad which is excellent in durability and in which adhesion between a polishing layer and a substrate layer is excellent. In a polishing pad having an abrasive layer formed on a substrate layer, Is composed of a thermosetting polyurethane foam having a substantially spherical open cell having an average cell diameter of 20 to 300 mu m and the polyurethane foam contains an isocyanate component and an active hydrogen containing compound as a raw material component, The compound is characterized by containing 30 to 85% by weight of a high molecular weight polyol having 2 to 4 functional groups and 20 to 100 mg KOH / g of hydroxyl value.n n n n A polishing pad, a base layer, a polyurethane foam, an active hydrogen-containing compound |
| priorityDate | 2007-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 109.