http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101398626-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4408 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-511 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 |
| filingDate | 2012-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101398626-B1 |
| titleOfInvention | Substrate processing apparatus and substrate processing method |
| abstract | The present invention relates to a substrate processing apparatus. According to an aspect of the present invention, there is provided a substrate processing apparatus including: a process chamber for forming an internal space in which a substrate is processed; A substrate support member disposed within the process chamber and supporting the substrate; A showerhead provided to face the substrate support member and having a plasma supply hole for partitioning the inner space into an upper space and a lower space, the upper space and the lower space communicating with each other; An excitation gas supply unit for supplying an excitation gas to the upper space; A process gas supply unit for supplying process gas to the lower space; And a microwave applying unit for applying a microwave to the upper space. |
| priorityDate | 2012-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.