| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-202
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2011-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2014-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101393197-B1 |
| titleOfInvention |
Method for forming resist pattern and radiation-sensitive resin composition |
| abstract |
The present invention relates to a resist composition comprising (1) a resist film forming step of applying a radiation-sensitive resin composition onto a substrate, (2) an exposure step, and (3) a developing step using a developing solution containing 80% The radiation-sensitive resin composition according to claim 1, wherein the radiation-sensitive resin composition comprises a base polymer having an acid-dissociable group [A], a polymer having a fluorine atom content higher than that of the [B] Wherein the content of the [E] compound is at least 10 parts by mass and at most 200 parts by mass based on 100 parts by mass of the polymer [A] And a resist pattern forming method. |
| priorityDate |
2010-10-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |