abstract |
The present invention relates to an etchant used for wet etching a metal film in a manufacturing process of a flat panel display (FPD), and more particularly, to a single film made of Ag or Ag alloy, an alloy film of Ag and a dissimilar metal, Ag-palladium alloy film / transparent electrode triple film, particularly multilayer films made of transparent conductive metals such as indium tin oxide (IZO) and indium zinc oxide (IZO). |