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filingDate 2007-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2014-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2014-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101390039-B1
titleOfInvention A method for manufacturing a ceramic, particularly a ceramic as the sputtering target, and a use of the ceramic
abstract A method of making a ceramic from an inorganic base material in the form of a powder having a high melting point comprises mixing a second inorganic component with a powder of an inorganic base material, Acting as a dopant. The dopant is composed of a single inorganic material or a mixture of at least two inorganic materials having a dopant effect on the inorganic base material. The method of the present invention further comprises a sintering step carried out at a high temperature. The ceramics thus obtained can be advantageously used as target elements due to their high density. The films and electrodes obtained from this ceramic have particularly favorable properties.n n n n Ceramic, target, target element, dopant, sputtering, compression, conductivity, resistivity
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190136335-A
priorityDate 2006-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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