http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101389801-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02532 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0262 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02661 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S438-976 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02238 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02255 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B25-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31662 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 |
| filingDate | 2008-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101389801-B1 |
| titleOfInvention | Method and apparatus for cleaning substrate surface |
| abstract | The present invention generally provides an apparatus and method for forming a clean and undamaged surface on a semiconductor substrate. One embodiment of the present invention provides a system including a cleaning chamber configured to expose a surface of a substrate with a plasma cleaning process prior to forming an epitaxial layer thereon. In one embodiment, a method of reducing contamination of a processed substrate in a cleaning chamber by depositing gettering material on the interior surface of the cleaning chamber prior to performing the cleaning process on the substrate. In one embodiment, the oxidation and etching steps are repeatedly performed on the substrate of the cleaning chamber to create or expose a clean surface on the substrate that may have an epitaxial located thereon. In one embodiment, a low energy plasma is used during the cleaning step. |
| priorityDate | 2007-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 45.