http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101387796-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-1461 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-4215 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2007-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101387796-B1 |
| titleOfInvention | The manufacturing method of photosensitive resin, the photosensitive resin obtained by the manufacturing method, and the photosensitive resin composition |
| abstract | The photosensitive resin which can be developed by ultraviolet exposure and an aqueous alkali solution, is highly sensitive, and also has good thermal stability and development control width, and exhibits excellent performance of a coating film, is suitable for the production of a photosensitive resin and the photosensitive obtained by the production method. It is a technical subject to provide a composition containing resin and the photosensitive resin.n n n In order to solve the above-mentioned problems, a resin obtained by reacting a saturated monobasic acid having an unsaturated monobasic acid and a primary alcoholic hydroxyl group with a novolak-type polyfunctional epoxy resin in the presence of a trivalent organophosphorus compound and a specific metal salt catalyst ( Provided is a method for producing a photosensitive resin by reacting polybasic acid anhydride with reactant I) (reactant II), and further reacting a compound having a radical polymerizable unsaturated group with an epoxy group and a water-soluble mono epoxy compound. Moreover, the photosensitive resin obtained by the said manufacturing method and the photosensitive resin composition containing this are provided. |
| priorityDate | 2007-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 148.