http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101387260-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-547 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C15-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-00 |
| filingDate | 2006-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101387260-B1 |
| titleOfInvention | Printable etching medium for silicon dioxide and silicon nitride layers |
| abstract | The present invention relates to novel printable etching media having non-Newtonian fluid flow behavior for etching of surfaces in the manufacture of solar cells and their use. The invention further relates to an etching and doping medium suitable for both etching of the inorganic layer and also doping of the underlying layer. In particular, the medium is a corresponding particle-containing composition in which extremely fine structures can be etched very selectively without damaging or invading the surrounding area. |
| priorityDate | 2005-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 189.