| abstract |
The present invention relates to a positive photosensitive polyimide varnish composition and a positive polyimide prepared using the same, and specifically, includes one or more kinds of polymers capable of producing a fine pattern that can be applied to the manufacture of semiconductor devices, display devices, and the like. It relates to a photosensitive polyimide varnish composition, a positive polyimide using the same and a film comprising the same. |