http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101374627-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32513 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32834 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32458 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32532 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F9-14 |
| filingDate | 2012-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101374627-B1 |
| titleOfInvention | Plasma processing apparatus |
| abstract | According to the present invention, the passage path for the plasma treatment of the plasma treatment material has a path shape spirally extending in the reactor, and the high-voltage generating electrode may be spirally extended in close contact with the spiral path of the treatment material in the reactor. It is to provide a plasma processing apparatus. To this end, the present invention is provided with an inlet at one end and an outlet at the other end, and a processing channel for processing the raw material and the processing gas supplied through the inlet by passing in a spiral shape. Forming a reactor for carrying out the material converted electrical and physical properties through the outlet; A material supply unit supplying a specific treatment target material to the inside of the reactor through the inlet; A gas supply unit provided separately from the material supply unit to supply a processing gas to the inside of the reactor through the inlet unit; and a spiral shape extending from the inlet unit to the outlet side by applying a constant power to the inside of the reactor. A power supply unit forming a processing channel of the substrate and causing the processing target material and the processing gas to move along the processing channel to generate a plasma reaction; First and second electrodes having different polarities respectively connected to both ends of the power supply unit form a spiral processing channel from the inlet side to the outlet side of the reactor, and are formed by the first electrode and the second electrode. First and second electrode portions for supplying a high voltage to inject a material to be processed and a processing gas between the processing channels to generate a plasma discharge reaction; Plasma discharge is generated in the processing channel formed by the high voltage supplied through the first and second electrode parts in the reactor, and converted into electrical and physical properties as the plasma is processed by the plasma to be discharged through the outlet. Characterized in that it comprises a; receiving portion for receiving the treatment material. |
| priorityDate | 2012-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 42.