http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101372119-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 2007-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101372119-B1 |
| titleOfInvention | Oxidation-stabilized CPM compositions and methods |
| abstract | The present invention provides a chemical-mechanical polishing (CMP) composition comprising an amino compound, a radical-forming oxidant, a radical scavenger capable of inhibiting radical-induced oxidation of the amino compound and an aqueous carrier therefor. Radical trapping agents include hydroxy-substituted polyunsaturated cyclic compounds, nitrogen-containing compounds or combinations thereof. Optionally, the composition comprises a metal oxide abrasive (eg, silica, alumina, titania, ceria, zirconia, or a combination of two or more of these abrasives). The present invention provides a method for chemically-mechanically polishing a substrate using a CMP composition as well as adding a radical scavenger to the CMP composition containing amines and radical-forming oxidants to improve shelf-life. Provide additional methods.n n n n CMP Compositions, Radical Capture Agents, Amino Compounds, Radical-forming Oxidizers |
| priorityDate | 2006-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 102.