http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101370994-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D5-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate | 2011-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101370994-B1 |
| titleOfInvention | Chemical liquid for protective film formation and cleaning method of wafer surface |
| abstract | Disclosed are chemical liquids for forming a water repellent protective film on at least the concave surface of a metal wafer, a surfactant having a hydrophobic part containing a hydrocarbon group having 6 to 18 carbon atoms with an HLB value of 0.001 to 10 by the Griffin method, It is water, and the density | concentration of the said surfactant in a chemical liquid is 0.00001 mass% or more and saturation concentration or less with respect to 100 mass% of total amounts of the said chemical liquid, It is a chemical liquid for water repellent protective film formation characterized by the above-mentioned. This chemical liquid can improve the cleaning process which tends to cause pattern collapse of the metal wafer. |
| priorityDate | 2010-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 104.