http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101362582-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1818 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D133-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D127-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1818 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2009-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101362582-B1 |
| titleOfInvention | Resist protective film material and pattern formation method |
| abstract | The present invention provides a resist protective film material containing a polymer compound (P1) having a repeating unit represented by the formula (1).n n n n n n n n (Wherein R 1 is a hydrogen atom, a methyl group or a trifluoromethyl group, R 2a and R 2b are a hydrogen atom or a straight, branched or cyclic alkyl group having 1 to 15 carbon atoms, and R 2a and R 2b are each other) May bond to form a ring together with the carbon atom to which they are bonded, R 3 is a single bond or a linear, branched or cyclic alkylene group having 1 to 15 carbon atoms, R 4 is a straight chain having 1 to 20 carbon atoms, It is a branched or cyclic alkyl group or a fluorinated alkyl group, and may include -O- or -C (= O)-.)n n n The resist protective film material includes a structure in which the hydroxyl group of hexafluoroalcohol is protected, and has excellent transparency to radiation having a wavelength of 200 nm or less.n n n Resist protective film material, a pattern formation method. |
| priorityDate | 2008-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 365.