http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101351361-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2011-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2014-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2014-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101351361-B1 |
| titleOfInvention | Negative pattern formation method and resist pattern |
| abstract | (i) a resin in which the polarity of the resin (A) is increased by the action of (A) acid, thereby reducing the solubility of the resin (A) in a developer containing at least one organic solvent, (B) actinic light or radiation Forming a film having a film thickness of 200 nm or more with a chemically amplified resist composition containing a compound capable of generating an acid by irradiation with (C) a solvent, (ii) exposing the film to form an exposed film And (iii) developing the exposed film with a developer containing at least one organic solvent. |
| priorityDate | 2010-11-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 327.