Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24479 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1807 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1812 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-10 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-10 |
filingDate |
2009-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2013-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2013-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-101343962-B1 |
titleOfInvention |
Fluorine-containing polymerizable monomers, fluorine-containing polymers, resist materials and pattern forming methods and semiconductor devices |
abstract |
The fluorine-containing polymerizable monomer represented by following General formula (1) is disclosed. (35) In formula, R < 1> represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group. n is 0 or 1, and m is an integer of 1- (3 + n). R 2 or R 3 each independently represent a hydrogen atom or a protecting group. The resist using the fluorine-containing polymer polymerized or copolymerized using this monomer is suitable for immersion exposure and fine processing performed by a double patterning process of immersion. |
priorityDate |
2008-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |