| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0149 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2012-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2013-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101343760-B1 |
| titleOfInvention |
pattern forming method |
| abstract |
By using microphase separation of the block copolymer, there is provided a pattern formation method capable of forming a pattern in a small process and inexpensively. According to the embodiment, the polymer film 12 is formed on the substrate 11, and the polymer film 12 is selectively irradiated with energy rays under the first and second conditions, thereby allowing the polymer film 12 to surface. Forming first and second regions having different free energies, forming a block copolymer layer 14 including first and second block chains on the polymer film 12, and microphase separating the block copolymer. A pattern forming method is provided. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019054814-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150076097-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102238922-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11530283-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021247195-A1 |
| priorityDate |
2011-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |