http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101342024-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate | 2008-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101342024-B1 |
| titleOfInvention | Coating type underlayer film forming composition for lithography containing a naphthalene resin derivative |
| abstract | It is providing the coating type underlayer film forming composition for lithography containing a naphthalene resin derivative.n n n General formula (1) below:n n n [Formula 1]n n n n n n n n (Wherein A represents an organic group having an aromatic group, R 1 represents a hydroxyl group, an alkyl group, an alkoxy group, a halogen group, a thiol group, an amino group, or an amide group, and m 1 represents the number of A substituted with a naphthalene ring) An integer of 6 is represented, m2 is an integer of 0 to 5 in terms of the number of R 1 substituted with a naphthalene ring, and m1 + m2 is an integer of 1 to 6, and the balance in the case other than 6 represents a hydrogen atom. It is a coating type underlayer film forming composition for lithography containing the compound shown by ().n n n Naphthalene resin, lithography, underlayer, photoresist |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101840909-B1 |
| priorityDate | 2005-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 174.