http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101336489-B1

Outgoing Links

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classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B29-403
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
filingDate 2011-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2013-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2013-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101336489-B1
titleOfInvention Chemical vapor deposition apparatus
abstract The present invention is a system and method for forming one or more materials, the system comprising a susceptor component configured to rotate about a central axis, and a showerhead component located above and not in direct contact with the susceptor component. It includes. In addition, the system includes one or more substrate holders located on the susceptor component and rotating around a central axis and also rotating around a corresponding holder axis, respectively, and a central component. Moreover, the system may include one or more first inlets formed in the central component, one or more second inlets, and one or more formed in the showerhead component and located further away from the central component than the one or more second inlets. And a third inlet.
priorityDate 2011-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 34.