Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
filingDate |
2009-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2013-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2013-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-101331919-B1 |
titleOfInvention |
Topcoat Compositions, Topcoats and Semiconductor Devices for Manufacturing Semiconductor Devices |
abstract |
A topcoat composition for photoresists comprising a fluorine-containing polymer having a repeating unit represented by the following General Formula (5) is disclosed. (31) In formula, R < 1> represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group. n is 0 or 1, and m is an integer of 1- (3 + n). R 2 or R 3 represents a hydrogen atom or a protecting group. This topcoat composition has moderate developer solubility. |
priorityDate |
2008-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |