http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101326614-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2933-0083 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L33-58 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-469 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-3842 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-424 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-565 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2012-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101326614-B1 |
| titleOfInvention | Manufacturing method of laminate for forming a fine pattern and laminate for forming a fine pattern |
| abstract | In order to form a fine pattern with a high aspect ratio in a to-be-processed object, providing the manufacturing method of the fine pattern formation laminated body and the fine pattern formation laminated body which can form a fine pattern with a thin residual film or no residual film easily The purpose. In the fine pattern forming laminate 1 of the present invention, the fine pattern forming laminate 1 used to form the fine pattern 220 on the object 200 via the first mask layer 103. As a mold, a mold 101 having a concave-convex structure 101a and a second mask layer 102 provided on the concave-convex structure 101a are provided, and the second mask layer 102 has a distance lcc and The height h of the uneven structure 101a satisfies the following formula (1), and the distance (lcv) and the height h satisfy the following formula (2). Formula (1) 0 <lcc <1.0h Equation (2) 0≤lcv≤0.05h |
| priorityDate | 2011-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 442.