http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101322549-B1

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filingDate 2006-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2013-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2013-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101322549-B1
titleOfInvention Device for manufacturing semiconductor or flat panel display using protective film structure, metal part using protective film structure and protective film structure
abstract Multifunctional manufacturing apparatus system which enables a plurality of processes that suppress reaction product deposition on the inner wall of a processing chamber of a manufacturing apparatus such as a semiconductor or a flat panel display, metal contamination due to corrosion of the inner wall, fluctuation of the process due to emission gas, and the like. It provides a protective film structure used for. On the surface of a metal material, it has a 1st coating layer which has an oxide film of the film thickness of 1 micrometer or less formed by direct oxidation of a base material as a base layer, and also forms the 2nd coating layer of about 200 micrometers. The effect of the protective layer having such a structure gives corrosion resistance to irradiation of ions and radicals in the protective film of the second layer, and prevents corrosion of the base metal metal surface by diffusing molecules and ions in the second protective film. Can be provided to the first layer oxide film, and metal contamination on the substrate generated on the surface of each metal member and the process chamber is reduced. Peeling of a 2nd layer protective film by the fall of the 2nd layer protective film adhesive force by corrosion of a base material and a 2nd layer protective film interface can be suppressed.n n n n Shield of metal member
priorityDate 2005-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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