http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101319493-B1
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
filingDate | 2010-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2013-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2013-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | KR-101319493-B1 |
titleOfInvention | Photosensitive resin composition and insulating film manufactured therefrom |
abstract | The present invention relates to a photosensitive resin composition and an insulating film produced therefrom. The photosensitive resin composition of this invention is a copolymer binder formed including an unsaturated carboxylic acid monomer, an epoxy-group containing unsaturated compound monomer, and an olefinic monomer; Quinone diazide photosensitizers; Mixtures of anhydride curing agents and polyacid curing agents; And organic solvents. The insulating film made of the photosensitive resin composition of the present invention is excellent in transmittance, flatness, pattern properties, heat resistance, adhesion to metals and inorganic materials, UV transmittance, residual film rate, pattern stability, mechanical properties and the like. |
priorityDate | 2010-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 172.