http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101311940-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-037 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-08 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2008-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101311940-B1 |
| titleOfInvention | Positive photosensitive resin composition |
| abstract | The present invention relates to a positive photosensitive resin composition, wherein the positive photosensitive resin composition comprises: (A) a polybenzoxazole precursor having a repeating unit represented by Formula 1 below; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) phenolic compounds; (E) sulfone compounds; And (F) a solvent.n n n [Formula 1]n n n n n n n n (The definition of each substituent in Formula 1 is the same as defined in the specification.)n n n Positive type, photosensitive polybenzoxazole precursor composition, aqueous alkali solution, semiconductor device |
| priorityDate | 2008-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 215.