http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101311447-B1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b828305495e1cdb63947a3a18aa633d1 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2012-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e821a929a1775aa0288df834e94e2289 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08e0125096e026027ec6b5f742c21c3b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d94181d1d28345401e758427fb236d99 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4da9411e20583b7093fe67e149439275 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65b034f5ebf5f2d2f280b423b5f6223b |
| publicationDate | 2013-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101311447-B1 |
| titleOfInvention | A water-soluble resin composition for forming a micropattern containing an amine salt and a polymer containing an amine and a method of forming a micropattern using the same |
| abstract | A water-soluble resin for forming a micropattern, which comprises a water-soluble polymer represented by the following formula (1) and a first water-soluble solvent and is heat-treated after coating on a photoresist film having a pattern formed by a development treatment, thereby reducing the size of the pattern. The composition is disclosed. (One) (In the above formula, R 1 , R 2 , R 3 and R 5 are each independently hydrogen, C 1 ~ C 20 alkyl group, C 3 ~ C 20 allyl group, C 6 ~ C 20 aryl group, C 1 ~ C 20 hydroxy alkyl, C 6 to C 20 hydroxy aryl, C 2 to C 20 carbonyl alkyl, C 7 to C 20 carbonyl aryl, C 1 to C 20 alkoxy alkyl, C 6 to C 20 is an alkoxy aryl or C 3-30 cycloalkyl group, R 4 is aryl sulfonic acid, alkyl sulfonic acid, alkyl carboxylic acid, aryl acid, hydrochloric acid, hydrofluoric acid, bromic acid or inorganic acid, a: b = 1 to 3: 0.1 3) |
| priorityDate | 2012-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 52.