http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101306150-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F216-165 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2800-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2810-50 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F230-085 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F216-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-06 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2005-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101306150-B1 |
| titleOfInvention | Polymer for Top Coating Membrane, Top Coating Solution Composition and Immersion Lithography Process Using the Same |
| abstract | A polymer for a top coating film, a top coating solution, and an immersion lithography process using the same are presented. The polymer is characterized by including deuterated carboxyl groups and having a suitable acidity which is not mixed with water and photoresist and can be dissolved in a developer. Therefore, when the polymer for the top coating film is applied to the immersion lithography process, fine and accurate patterning can be realized.n n n n Top Coating Film, Immersion Lithography Process |
| priorityDate | 2005-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 139.