| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F12-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-22 |
| filingDate |
2012-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2013-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101305067-B1 |
| titleOfInvention |
Sensitive actinic ray-sensitive or radiation-sensitive resin composition, a sensitizing actinic ray or radiation-sensitive film using the same, and a pattern forming method |
| abstract |
An actinic ray-sensitive or radiation-sensitive resin composition having a high resolution and good shape of an isolated line pattern and also excellent in other resist performance including roughness characteristics, an actinic ray-sensitive or radiation-sensitive film using the same And providing a pattern forming method. Actinic ray-sensitive or radiation-sensitive resin containing at least one phenolic hydroxyl group and a compound (P) containing at least one group in which the hydrogen atom of the phenolic hydroxyl group is substituted by a group represented by the following general formula (1): (Each sign in a formula represents the meaning of a claim and specification.) |
| priorityDate |
2011-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |