| abstract |
The large sputtering target which has favorable discharge characteristics at the time of sputtering, or the characteristic of the obtained thin film is provided. In addition, by using a cold hydrostatic press, it is possible to directly obtain a large-sized molded article having excellent shape precision without preforming, and to manufacture a sintered compact which can efficiently and efficiently produce a sintered compact capable of obtaining the above-mentioned good sputtering target. Provide a method. A sputtering target is manufactured using the sintered compact which made content of carbon contained as an impurity less than 0.005 weight%. Moreover, such a sintered compact can be obtained by shape | molding raw material powder directly by cold hydrostatic press, and baking, without adding the binder containing a organic substance, or a shaping | molding adjuvant. In addition, by using the molding die which has a structure which can pressurize only the raw material powder to be filled at the time of pressurization substantially from a single axial direction, and at the time of pressure reduction after pressure pressurization, isotropically open | releases a pressure with respect to a molded object, It becomes possible to manufacture a sintered compact. In addition, it is possible to produce a large target having a thick thickness of the erosion region in good yield, and improve the use efficiency of the target. |