| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0277
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C303-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-24 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2009-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2013-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101297266-B1 |
| titleOfInvention |
Fluorinated sulfonates having a polymerizable anion, a method for producing the same, a fluorine-containing resin, a resist composition, and a pattern forming method using the same |
| abstract |
According to this invention, the polymerizable onium fluoride sulfonate salt represented by following General formula (2) and the polymer which superposed | polymerized this are provided. By using the sulfonate resin of the present invention, the resolution is excellent, the depth of focus margin (DOF) is large, the line edge roughness ("LER") is small, and a highly sensitive resist composition can be prepared. [Formula 120] Wherein Z represents a substituted or unsubstituted linear or branched alkylene group having 1 to 6 carbon atoms or a divalent group obtained by desorption of two hydrogen atoms from the alkylene group and an alicyclic hydrocarbon or aromatic hydrocarbon in series. R represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 3 carbon atoms or a fluorine-containing alkyl group. Q + represents a sulfonium cation or iodonium cation.) |
| priorityDate |
2008-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |