http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101297165-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-114 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2005-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101297165-B1 |
| titleOfInvention | Photoresist compositions |
| abstract | There is provided a chemically amplified positive photoresist composition comprising a resin having an acetal and an alicyclic group. The photoresist of the invention can exhibit significantly increased lithographic properties. Preferred photoresists of the invention include one or more photoacid generator compounds and / or one or more phenolic resins having one or more photoacid-labile acetal groups and one or more alicyclic groups such as adamantyl do. |
| priorityDate | 2004-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 87.