http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101289223-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0755 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 2006-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101289223-B1 |
| titleOfInvention | Formation of radiation-sensitive resin composition and interlayer insulating film and microlens |
| abstract | The present invention contains a copolymer of a compound having a structure having an ether bond such as unsaturated carboxylic acid and / or unsaturated carboxylic anhydride, oxetane compound and tetrahydrofuran structure and a 1,2-quinonediazide compound. A radiation sensitive resin composition used for forming a microlens and an interlayer insulating film is provided.n n n n Radiation-sensitive resin composition, interlayer insulating film, microlens |
| priorityDate | 2005-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.