http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101283817-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D17-001 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2885 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D21-14 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-288 |
| filingDate | 2011-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101283817-B1 |
| titleOfInvention | Substrate plating apparatus |
| abstract | In a substrate plating apparatus according to an embodiment of the present invention, an electrolyte is accommodated, and a target portion for generating metal ions when an electric power is applied is installed at an inner lower portion thereof, and a chuck for holding a substrate, which is a plating target, is liftable at an upper portion thereof. A process chamber; And at least a portion of the substrate is movable in a horizontal direction between the substrate and the target portion to individually spray ionic materials containing a high concentration of metal ions toward a portion of the substrate having a relatively low current density during a plating process on the substrate. It may include a mobile ion injection unit. According to an exemplary embodiment of the present invention, an ion material containing a high concentration of metal ions may be supplied to a region having a relatively low current density in a portion of the substrate, thereby improving reliability of substrate plating. |
| priorityDate | 2011-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 16.