Predicate |
Object |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-1608 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0475 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02024 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
filingDate |
2009-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2013-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate |
2013-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
KR-101281879-B1 |
titleOfInvention |
Silicon Carbide Polishing Method Using Water Soluble Oxidizer |
abstract |
The method includes chemical-mechanically polishing a substrate comprising at least one layer of silicon carbide with a polishing composition comprising a liquid carrier, abrasive and an oxidant. |
priorityDate |
2008-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |