http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101280630-B1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-65 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-65 |
| filingDate | 2007-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2013-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2013-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | KR-101280630-B1 |
| titleOfInvention | Novel sulfonates and their derivatives, photoacid generators and resist materials and pattern forming methods using the same |
| abstract | The present invention relates to a sulfonate represented by the following formula (1).n n n ≪ Formula 1 >n n n n n n n n (M + is a lithium ion, sodium ion, potassium ion, ammonium ion or tetramethylammonium ion.)n n n The sulfonic acid of the present invention exhibits strong acidity because only the α and β positions are substituted with fluorine, and since it has a hydroxyl group, the acid diffusion length can be appropriately suppressed by hydrogen bonding or the like. In addition, it is easy to introduce various substituents by reacting with acid halides, acid anhydrides and alkyl halides, and is useful as synthetic intermediates having a wide range of molecular designs. Moreover, these photoacid generators which generate sulfonic acid can be used without any problems in various processes in the device manufacturing process, and have low molecular weight and hydrophilic group, so that the accumulation in the body is low and the combustibility at the disposal of combustion is high.n n n n Sulfonates, sulfonic acids, photoacid generators, chemically amplified resist materials |
| priorityDate | 2006-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20080008415-A |
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID467662339 |
Total number of triples: 28.