http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101271248-B1

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filingDate 2011-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2013-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2013-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101271248-B1
titleOfInvention Semiconductor manufacturing equipment for epitaxial process
abstract According to an embodiment of the present invention, a semiconductor manufacturing apparatus includes a cleaning chamber in which a cleaning process is performed on a substrate; An epitaxial chamber in which an epitaxial process of forming an epitaxial layer is formed on the substrate; And a transfer chamber coupled to the side of the cleaning chamber and the epitaxial chamber and having a substrate handler for transferring the substrate having the cleaning process completed to the epitaxial chamber, wherein the cleaning chamber includes a plurality of substrates. It is characterized by the arrangement type which is made with respect to.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2021257889-A1
priorityDate 2011-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 36.