http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101271246-B1

Outgoing Links

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-677
filingDate 2011-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2013-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2013-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber KR-101271246-B1
titleOfInvention Semiconductor manufacturing equipment for epitaxial process
abstract According to an embodiment of the present invention, a semiconductor manufacturing apparatus includes a cleaning chamber in which a cleaning process is performed on a substrate; An epitaxial chamber in which an epitaxial process of forming an epitaxial layer is formed on the substrate; A buffer chamber having a loading space for loading the substrate; And a transfer chamber coupled to the cleaning chamber, the buffer chamber, and the epitaxial chamber and having a substrate handler for transferring the substrate between the cleaning chamber, the buffer chamber, and the epitaxial chamber. The substrate handler sequentially loads the substrate on which the cleaning process is completed into the loading space, and then transfers the loaded substrates to the epitaxial chamber, and sequentially transfers the substrate on which the epitaxial layer is formed to the loading space. It is characterized by loading.
priorityDate 2011-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 30.