| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76885
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76817
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76811
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76802
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76819
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76838
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate |
2005-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2013-05-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
KR-101262730-B1 |
| titleOfInvention |
Method of Forming In-Situ Groove Structure |
| abstract |
The present invention features a method of forming a pattern on a substrate comprising forming a multi-layer film having a surface, an etch-rate interface, and an etch-differential interface over a substrate. The etch-differential interface is confined between the etch-rate interface and the surface. The recorded pattern is transferred onto a substrate that is partially defined by an etch-differential interface. The recorded pattern has an etched pattern feature (EPC) that defines the pattern shape formed in a given etching process or set of etching processes. The etch-differential interface modifies the EPC. By establishing a suitable etch-differential interface, a recorded pattern having substantially different shapes as compared to the pattern of the patterned layer may be obtained, or the same pattern may be obtained. |
| priorityDate |
2004-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |